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8.

Batch production scheduling for semiconductor back-end operations.(Report)
by Mengying Fu

IEEE Transactions on Semiconductor Manufacturing, May, 2011, Vol.24(2), p.249(12)

16.

Wafer bevel protection during deep reactive ion etching.(Report)
by Charavel, Remy

IEEE Transactions on Semiconductor Manufacturing, May, 2011, Vol.24(2), p.358(8)

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