schliessen

Filtern

 

Bibliotheken

7.

Gate double patterning strategies for 10-nm node FinFET devices
by Hody, Hubert

Journal of Micro/Nanolithography, MEMS, and MOEMS, 01 January 2015, Vol.14(1), pp.014504-014504

15.

Microscale pattern etch of 4H–SiC by inductively coupled plasma
by Zhuang, Shiwei

Journal of Materials Science: Materials in Electronics, 2019, Vol.30(20), pp.18788-18793

123

Recommended databases

Find more Articles matching your search terms in these recommended databases.

Filter electronic articles 44 Hits